Czochralski Crystal Growth Furnace

The Czochralski single crystal growth equipment utilizes vacuum suspension melting, with temperatures reaching up to 2100°C. This system includes a high-frequency induction power supply, a high-vacuum chamber, a water-cooled copper crucible (used for suspension melting), and a precision lifting mechanism. Suspension melting prevents sample contamination by the crucible, enabling the production of high-purity metal single crystals.

In a precisely controlled environment, a small "seed" single crystal is brought into contact with the melt of the same material. Then, through slow upward pulling and rotation, the melt continuously grows epitaxially on the seed crystal according to its original lattice structure, ultimately forming a larger single crystal boule.

The Czochralski method has become a mainstream technique for preparing electronic and optical grade single crystals, primarily due to the following significant advantages:

1.High crystal quality

2.Ability to grow large-sized, highly integral single crystals

3.Fast growth speed and high efficiency

4.Visual observation and control of the growth process

5.Ability to control crystal orientation

6.Capability to grow high-melting-point crystals

Application Fields:

1.Microelectronics industry

2.Optoelectronics industry

3.Semiconductor lighting and display

4.Optical components

5.Scientific research

The Czochralski crystal growth furnace is a key piece of equipment for producing high-quality, large-sized single crystals. Its significant technical advantages make it indispensable across numerous fields, from fundamental scientific research to modern information technology and high-end manufacturing.

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